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Surface tension
Measuring range: 10…100 mN/m (dyn/cm)
Measuring deviation max.: 1% of full scale value
Resolution: 0.1 mN/m (dyn/cm)
Bubble lifetime / surface age
Bubble lifetime range: 15…20,000 ms
Max. deviation: 5 %
Sample temperature
Measuring range: 0…100 °C
Resolution: 0.1 K
Concentration
Measuring range: user-defined
Power supply
Mains adapter / USB: 100…240 V / 5 V
Li-Ion Battery: 3.6 V / 2,000 mAh min. 10 h operating
Power consumption: 2.5 W max.
General data
USB-interface: data transfer
Display: LCD, illuminated
Measuring profiles: 25
Memory: 25 readings/profile
Dimensions (HxWxD): 168 x 75 x 35 mm
Weight: 260 g
PRECISE
Display of surfactant concentration within defined limits
Comparability of measuring values with all SITA lab and process measuring devices
Adjustable high dynamic bubble lifetime range: 15 ms…20.000 ms
ROBUST
Patented and optimized capillary for process use
Robust device housing for atline measurement
Comfortable suitcase for transport and device storage, also useful as working surface
FLEXIBLE
Intuitive operation: simple and fast measuring as well as controlling
Mobile hand-held tensiometer: no PC or notebook required
25 measuring profiles for bath control, process documentation and more
Optional Windows-Software SITA-ProcessLog
Application fields
The DynoTester+ is especially used in following applications:
- Controlling the surfactant concentration in industrial parts cleaning industry
- Monitoring the surfactant concentration in electroplating baths
- Measuring the surface tension of liquids at the plant (atline) or in the laboratory (offline)
- Quality control of inkjet inks, paints and lacquers/varnishes
- Incoming and outgoing inspections of surfactant containing goods
- Mobile use for external work
For your security our application engineers advise you, if the DynoTester+ is suitable for your application. Furthermore, we test your samples and develop an appropriate controlling procedure according to your processes.
Result: The DynoTester+ optimally supports you in quality control and process monitoring.
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